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Prof. Janez Kovač: X-ray photoelectron spectroscopy (XPS), a method for surface and thin film characterisation

Date: 21. 3. 2017
Source: Monday physics colloquium
Ponedeljek, 27. marec 2017, ob 16:15 v predavalnici F1, FMF UL, Jadranska 19, Ljubljana

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Povzetek:

X-ray photoelectron spectroscopy (XPS), a method for surface and thin film characterisation

Prof. Janez Kovač

Jožef Stefan Institute, Ljubljana

X-ray photoelectron spectroscopy – XPS or ESCA – is a powerful method for characterization of surfaces, thin films and nanostructures with very high surface sensitivity (3-5 nm). The XPS method provides a data on the elemental chemical composition, chemical bonding of elements and electronic properties of surfaces, thin films and multilayered structures. This method is non-contact and it is based on the photoeffect, i.e. the irradiation of the specimen surface by a monochromatic X-ray beam from metallic anode or from synchrotron light and analysis of the photoelectrons emitted from the surface in ultra-high vacuum. In this presentation some examples of XPS surface analyses of polymers, oxides and catalytic materials as well as depth profiling of thin film structures will be presented.